Shandong Juzhi Semiconductor Technology Co., Ltd

year: Founded in

year: Registered in

million: Registered capital

devices: Delivery quantity of the entire equipment

About us

Shandong Juzhi Semiconductor Technology Co., Ltd

The company was founded in August 2022 and registered in April 6, 2023, with a registered capital of 50 million yuan. The core members of the company have more than ten years of experience in the semiconductor industry, covering key positions such as integrated circuits, MEMS, LED, solar equipment services, spare parts,… MORE +

Product display

The core members of the company have more than ten years of semiconductor industry experience, covering integrated circuits, MEMS, LED, solar equipment services, spare parts and other key positions

lithography gear

Lithography is the most complex and critical process step in the semiconductor chip production process, which is time-consuming and costly. The difficulty and key point in semiconductor chip production lies in how to create target circuit patterns on silicon wafers, which is achieved through photolithography.

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Wet cleaning equipment

It is through the use of chemical liquids to remove impurities, residues and pollutants on the surface of the chip to ensure the purity and performance of the chip.

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Etching equipment

The basic principle is to first process a mask of a specific pattern on the surface of a semiconductor material, and then use the RIE/ICP device to control the etching gas to etch away the place where there is no mask, and finally leave a specific pattern

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Bonding machine

Two homogeneous or heterogeneous wafers are closely combined by chemical and physical action, so as to realize the electrical interconnection, function integration and device packaging of microelectronic materials, photoelectric materials and nano-level MEMS

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Glue-coated developer

As the input (pre-exposure photoresist coating) and output (post-exposure graphics development) of the lithography machine, the wafer is transmitted and processed between the various systems mainly through the manipulator, so as to complete the photoresist coating, curing, developing, hardening and other processes of the wafer, which not only directly affects the formation of fine exposure patterns in the photolithography process. The graphics quality of the development process also has a profound impact on the results of the graphics transfer in the subsequent etching and ion implantation processes, and is an indispensable key processing equipment in the integrated circuit manufacturing process

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Thin film equipment

1, Endura@HP PVD system is a fully automatic physical vapor deposition (PVD) system, using a single chip process, multi-cavity design. The system is 8 "(200 mm wafer). It uses a stepped-vacuum system that allows for short pump drops to achieve ultra-high vacuum. The multi-chamber design allows precise control of all process parameters.

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Furnace tube

The furnace tube is the place where the silicon wafer is heated, which is composed of a vertical quartz bell, a multi-zone heating resistance wire and a heating tube sleeve.

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