Ion implanter is the key equipment in the pre-manufacturing process of integrated circuit. Ion implanter is the technology of doping the area near the surface of semiconductor to change the carrier concentration and conduction type of semiconductor. Compared with the conventional thermal doping process, ion implantation can accurately control the injection dose, injection Angle, injection depth, transverse diffusion, etc., overcome the limitations of the conventional process, improve the circuit integration, opening speed, yield and life, and reduce the cost and power consumption. Ion implanter is widely used in doping process, which can meet the requirements of shallow junction, low temperature and precise control, and has become an indispensable key equipment in integrated circuit manufacturing process.
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